SF-100 XPRESS | Canada Analytical & Process Technologies

SF-100 XPRESS
Since July, 2008, the SF-100 XTREME has been the industry’s leading maskless lithography solution for patterning lines as small as 1 micron in size, with previously unheard of flexibility and performance. However, since all user’s are not in a financial position to purchase this superior system, we have introduced the SF-100 XPRESS. This system is built on the same platform as the SF-100 XTREME, but offers the user the ability to customize their SF-100 XPRESS for their specific needs, purchasing only those features that are critical to their process. The result is the same exceptional performance at a lower cost. And, since both systems utilize the same platform, the SF-100 XPRESS can be fully upgraded in the field to an SF-100 XTREME.

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