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CG-1000
Monitoring the atmosphere is the lithography area of the clean room is one of the first steps in preventing "Foreign Particles" and "HAZE"
With the increasingly minute processing required in semiconductor manufacturing, ever stricter control of production flow has also become necessary. This is particularly true of current lithography process, where tight control of the process atmosphere is required. With lithography, control of trace ammonia gas has grown in importance, due to its role as a cause of HAZE. Hazing generates foreign particles on the surface of the mask and clouds the internal lens of the exposure unit. To address the problems the ultra-low concentration of ammonia causes, it has been necessary to develop real-time monitoring, HORIBA meets this important need with the CG-1000 Trace Ammonia Gas Monitor. The CG-1000 features new CRDS measurement technology and is designed for in-process versatility.
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