SF100 Maskless Photolithography Tool System Requirements

 
  • The SF100 gives you the ability to rapidly project master images directly onto your substrates enabling faster development time without the requirement for a photomask. This document is intended to assist us to provide you with the model which best meets your design requirements. We ask your assistance by filling in as much detail as possible.
  • Contact Information

  • Application

  • Importance of Features

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  • Other

 

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