Semiconductor & Vacuum Coating Process | Canada Analytical & Process Technologies

	Electron Beam Gun Crucible Indexer Versatile, Reliable Control of Multi-Pocket E-Beam Sources		FabGuard ® Suite Acquisition, Analysis, Interdiction and Reporting in one Fully Integrated System
	In Situ Particle Detectors INFICON Stiletto® is a scanning-laser particle detection system that can find yield-limiting particle contamination in real time on every wafer		Integrated Process Monitoring Integrated Process Monitoring delivers direct measurement of process conditions for on-time metrology.
	Leak Detectors Defining Speed and Accuracy in Leak Detection		RF Sensing Technology with FabGuard Combines the latest technical advancements in RF sensor design with quality manufacturing procedures to create a unique range of RF products to meet today's semiconductor tool process measurement needs
	Residual Gas Analyzers (RGAs) Used as diagnostic tools to aid process engineers in continuously monitoring the manufacturing process for the presence of contaminant gases and for verifying the presence of desired process gases.		Thin Film Deposition Controllers/QCM Measurement Instruments Control deposition rate and thickness of the most complex processes with unsurpassed measurement speed and precision.
	Plasma Diagnosis Endpoint Monitor, EV-140C This is an emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.		Real Time Interferometric Process Monitor, DIGILEM-CPM-Xe/Halogen - [CCD] External Light Source Interference Camera Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.
	Real Time Interferometric Process Monitor , LEM-CT-670-G50 - [CCD] Laser Interference Camera Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.		Highly Sensitive Silica Monitor - SLIA-300 This product provides enhanced support for the pure water processes in the production of semiconductors.