Atomic Layer Deposition (ALD)
PicoSun Atomic Layer Deposition (ALD)
- Dual chamber hot wall reactors for R&D and production.
- Deposition on 2-8’’ (50-200 mm) wafers, 3-dimensional objects and porous substrates (R-series)
- Batches for 4-12” or 156×156 mm2 wafers (P-Series)