CS-153
The CS-153 is a high-precision chemical solution concentration monitor designed to meet the strict demands of semiconductor wet-etching processes. Etching processes use FPM solution to etch silicon oxide and remove particles from the wafer surface. The CS-153 continually monitors each component of the FPM solution (HF/H2O2/H2O), alerting the user each time the solution is replaced or replenished. This allows you to maintain the concentration of the FPM solution within the tolerance range, while eliminating unnecessary solution replacement.

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